Locations
Eindhoven, Netherlands
industry
Deeptech · Nanotechnology
Size
11-50 employees
Stage
Seed
founded in
2016
SCIL Nanoimprint Solutions offers solutions for patterning nano-structures on large wafers by using its unique and proprietary lithography technology (SCIL). SCIL, or Substrate Conformal Imprint Lithography, is a cost-effective, robust, high-yield process enabling nanometer resolution patterns on a large variety of materials. SCIL delivers proven, high-quality imprints on wafer areas up to 300 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment down to 1 µm. We help customers with optimized equipment, consumable materials, and processes for high-volume production. Our solutions enable manufacturers of optics and photonic products to increase performance, lower end-product costs, and increase functionality.
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